• <menu id="aoo68"></menu>
    <menu id="aoo68"><menu id="aoo68"></menu></menu><tt id="aoo68"><strong id="aoo68"></strong></tt>
    <menu id="aoo68"><strong id="aoo68"></strong></menu>
  • <menu id="aoo68"><nav id="aoo68"></nav></menu>

    Jiangsu Leadmicro Nano-Equipment Technology Ltd


    Highly optimized batch ALD technology enables an intelligent world

    Energy efficient lighting and display, personal communication devices, healthcare and personal wellness, smart-city and Internet-of-Things, we are living in an ever intelligent world that is connected by complex smart systems. Compound semiconductor and MEMS industry are experiencing fast growth with diverse applications of these complex smart systems for volume production of better performances and reliability and yet cost-efficient products. Leadmicro offers high-productivity single wafer and batch ALD thin film deposition solutions for large or small IDMs (Integrated Device Manufacturers) and foundries for high-volume manufacturing of compound semiconductor and MEMS devices that enables better performances and reliability and yet affordable.

    Qilin Series Batch ALD Thin Film System

    Standalone and integratable with most commercial automated wafer loading systems and cluster platforms, Leadmicro’s state-of-the-art Qilin series Batch ALD reactors is dedicated for batch wafers ALD thin film processing for 100, 150 and 200 mm wafers. The proprietary designed reactor is capable of extreme conformal and uniform ALD thin film deposition of a large variety of materials. Versatile and flexible, the Qilin system features superb performances with high throughput and extremely low cost-of-ownership.

    Available Processes:
    Oxides:SiO2 , Al2O3 , HfO2 , ZrO2 , Ta2O5 , Nb2O5 , TiO2 , ZnO , SrTiO3
    Nitrides: TiN , Ta2N5 , AlN
    Metals: Ru , Pt
    Temperature Range: RT - 500oC
    Wafer Sizes: 100, 150 and 200mm

    Copyright?Jiangsu Leadmicro Guide Nano Equipment Technology Co., Ltd. All Rights Reserved. All Rights Reserved. 苏ICP备16047353号-1